Breaking polymer chains by dynamic plowing lithography

被引：46

作者：

Cappella, B ^{[1
]}

Sturm, H ^{[1
]}

Weidner, SM ^{[1
]}

机构：

[1] Fed Inst Mat Res, BAM, Lab 6 32, D-12200 Berlin, Germany

来源：

POLYMER | 2002年 / 43卷 / 16期

关键词：

AFM; nanolithography; chain scission;

D O I：

10.1016/S0032-3861(02)00285-9

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

The adhesion of poly(methyl methacrylate) (PMMA) and polystyrene (PS) films, whose surface has been previously structured by dynamic plowing lithography (DPL), has been measured by means of force-displacement curves. The different adhesion of modified and unmodified PS leads to the assumption that polymer chains are broken during DPL. After measuring the energy dissipated by the tip during DPL, in order to check that the transferred energy is sufficient to break covalent bonds, the polymer chain scission caused by the lithographic process has been definitely confirmed by size exclusion chromatography measurements of the lithographed films. (C) 2002 Published by Elsevier Science Ltd.

引用

页码：4461 / 4466

页数：6

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