Dry thienylation of the silicon (111)-(7 x 7) surface

被引：52

作者：

Cao, Y

Yong, KS

Wang, ZQ

Chin, WS

Lai, YH

Deng, JF

Xu, GQ

机构：

[1] Natl Univ Singapore, Dept Chem, Singapore 119260, Singapore

[2] Fudan Univ, Dept Chem, Shanghai 200433, Peoples R China

来源：

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY | 2000年 / 122卷 / 08期

关键词：

D O I：

10.1021/ja993386q

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

页码：1812 / 1813

页数：2

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