Growth and structural characterization of highly oriented sputter-deposited (111), (110), and (100) Co/Cu superlattices

被引：9

作者：

Smith, DJ

Modak, AR

Rabedeau, TA

Parkin, SSP

机构：

[1] STANFORD LINEAR ACCELERATOR CTR,STANFORD SYNCHROTRON RADIAT LAB,STANFORD,CA 94309

[2] IBM CORP,ALMADEN RES CTR,DIV RES,SAN JOSE,CA 95120

[3] ARIZONA STATE UNIV,DEPT PHYS & ASTRON,TEMPE,AZ 85287

来源：

APPLIED PHYSICS LETTERS | 1997年 / 71卷 / 11期

关键词：

D O I：

10.1063/1.119942

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Highly oriented, sputter-deposited (111), (110), and (100) Co/Cu superlattices have been grown simultaneously on substrates of Al2O3 (sapphire), MgO (110), and (100), respectively, using thin seed layers of Pt or Pd deposited at similar to 500 degrees C. High-resolution electron microscopy and x-ray scattering demonstrate that the films are epitaxial and of excellent crystallinity. (C) 1997 American Institute of Physics.

引用

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页码：1480 / 1482

页数：3

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