SEEDED EPITAXY OF METALS BY SPUTTER-DEPOSITION

被引：29

作者：

HARP, GR ^{[1
]}

PARKIN, SSP ^{[1
]}

机构：

[1] IBM CORP,ALMADEN RES CTR,DIV RES,SAN JOSE,CA 95120

来源：

APPLIED PHYSICS LETTERS | 1994年 / 65卷 / 24期

关键词：

D O I：

10.1063/1.112507

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

It is not generally appreciated that crystalline metallic thin film structures can be prepared using sputter deposition techniques by growth onto single crystalline substrates. Three systems, fcc Co/Cu(100), bcc Co/Cr(100), and hcp Co/Ru(101̄3) multilayers are described in detail from a comprehensive study of more than 40 different systems. It is shown that the use of thin "seed" layers readily allows the preparation of different crystal structures and/or crystal orientations for the same substrate. © 1994 American Institute of Physics.

引用

页码：3063 / 3065

页数：3

共 21 条

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