Micro-contact printing on oxide surfaces for model catalysts using e-beam written masters in hydrogen silsesquioxane

被引:9
作者
van Delft, FCMJM
van den Heuvel, FC
Kuiper, AET
Thüne, PC
Niemantsverdriet, JW
机构
[1] Philips Res Labs, NL-5656 AA Eindhoven, Netherlands
[2] Tech Univ Eindhoven, Schuit Inst Catalysis, NL-5600 MB Eindhoven, Netherlands
关键词
micro-contact printing; catalyst; catalysis; electron beam lithography; hydrogen silsesquioxane;
D O I
10.1016/j.mee.2004.02.041
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In order to make model catalysts for fundamental research in heterogeneous catalysis, carrier oxide surfaces with well-defined properties are needed. Micro-contact printing has been used to make specific parts of a (hydroxylated) silicon oxide surface hydrophobic. The method comprises the e-beam writing of a master in hydrogen silsesquioxane (HSQ) on silicon, the casting of a polydimethylsiloxane (PDMS) silicone elastomer stamp, the inking of the stamp with octadecyltrichlorosilane (OTS) and the printing of the OTS on a hydroxylated SiO2 surface. KCl crystals have been precipitated on the hydrophilic part of the printed surface by evaporation of ethanol droplets with dissolved KCl. KCl serves as a model system for the usual transition metal salts employed in the preparation of metal- or metal-oxide catalysts. Crystal size and crystallite density-on-carrier can be determined by the duty cycle and pitch of the hydrophilic part of the printed surface. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:202 / 208
页数:7
相关论文
共 9 条
[1]  
Chorkendorff I., 2003, Concepts of Modern Catalysis and Kinetics, V2a
[2]   Stability of molded polydimethylsiloxane microstructures [J].
Delamarche, E ;
Schmid, H ;
Michel, B ;
Biebuyck, H .
ADVANCED MATERIALS, 1997, 9 (09) :741-746
[3]   Surface science approach to modeling supported catalysts [J].
Gunter, PLJ ;
Niemantsverdriet, JW ;
Ribeiro, FH ;
Somorjai, GA .
CATALYSIS REVIEWS-SCIENCE AND ENGINEERING, 1997, 39 (1-2) :77-168
[4]  
Henry CR, 1998, SURF SCI REP, V31, P235
[5]   Sub-10 nm linewidth and overlay performance achieved with a fine-tuned EBPG-5000 TFE electron beam lithography system [J].
Maile, BE ;
Henschel, W ;
Kurz, H ;
Rienks, B ;
Polman, R ;
Kaars, P .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2000, 39 (12B) :6836-6842
[6]   Nano-patterning of a hydrogen silsesquioxane resist with reduced linewidth fluctuations [J].
Namatsu, H ;
Yamaguchi, T ;
Nagase, M ;
Yamazaki, K ;
Kurihara, K .
MICROELECTRONIC ENGINEERING, 1998, 42 :331-334
[7]  
Somorjai G. A, 2010, Introduction to surface chemistry and catalysis
[8]   Hydrogen silsesquioxane/novolak bilayer resist for high aspect ratio nanoscale electron-beam lithography [J].
van Delft, FCMJM ;
Weterings, JP ;
van Langen-Suurling, AK ;
Romijn, H .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2000, 18 (06) :3419-3423
[9]   Unconventional methods for fabricating and patterning nanostructures [J].
Xia, YN ;
Rogers, JA ;
Paul, KE ;
Whitesides, GM .
CHEMICAL REVIEWS, 1999, 99 (07) :1823-1848