Surface Analysis of Titanium Cleaning and Activation Processes: Non-thermal Plasma Versus Other Techniques

被引:32
作者
Cools, Pieter [1 ]
De Geyter, Nathalie [1 ]
Vanderleyden, Els [2 ]
Dubruel, Peter [2 ]
Morent, Rino [1 ]
机构
[1] Univ Ghent, Dept Appl Phys, Res Unit Plasma Technol RUPT, Fac Engn, B-9000 Ghent, Belgium
[2] Univ Ghent, Dept Organ Chem, Polymer Chem & Biomat Res Grp PBM, Fac Sci, B-9000 Ghent, Belgium
基金
欧洲研究理事会;
关键词
AFM; Dielectric barrier discharge; Medium pressure plasma; Titanium; XPS; DISCHARGE; FILMS; ACID; XPS; CONTAMINATION; OXIDATION; ENERGY;
D O I
10.1007/s11090-014-9552-2
中图分类号
TQ [化学工业];
学科分类号
081705 [工业催化];
摘要
A medium pressure (5 kPa) dielectric barrier discharge operating in different atmospheres (air and argon) is used to develop a fast and easy way to remove adsorbed carbon contamination. Chemical and physical changes at the sample surface after plasma treatment are studied, making use of contact angle measurements, X-ray photoelectron spectroscopy analysis and atomic force microscopy measurements. The obtained results are compared with other chemical and thermal treatments typically used. This comparison shows that plasma treatment at medium pressure is able to remove up to 20 % more of the adsorbed carbon compared to the classical cleaning methods, while at the same time being less aggressive, leaving the sub-surface chemistry unchanged. Moreover, the analysis techniques give a fundamental insight in the reactions processes at the titanium surface when exposed to a medium pressure plasma.
引用
收藏
页码:917 / 932
页数:16
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