Gas discharge plasmas and their applications

被引:729
作者
Bogaerts, A
Neyts, E
Gijbels, R
van der Mullen, J
机构
[1] Univ Instelling Antwerp, Dept Chem, B-2610 Antwerp, Belgium
[2] Eindhoven Univ Technol, Dept Appl Phys, NL-5600 MB Eindhoven, Netherlands
关键词
plasma; gas discharge; direct current; radio-frequency; pulsed; dielectric barrier discharge; magnetron; surface modification; lamps; lasers; plasma display panels;
D O I
10.1016/S0584-8547(01)00406-2
中图分类号
O433 [光谱学];
学科分类号
0703 ; 070302 ;
摘要
This paper attempts to give an overview of gas discharge plasmas in a broad perspective. It is meant for plasma spectroscopists who are familiar with analytical plasmas (glow discharges, ICPs and microwave discharges), but who are not so well aware of other applications of these and related plasmas. In the first part, an over-view will be given of the various types of existing gas discharge plasmas, and their working principles will be briefly explained. In the second part, the most important applications will be outlined. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:609 / 658
页数:50
相关论文
共 196 条
[1]  
Abeywickrama M. G., 1997, LAMPS LIGHTING, P194
[2]  
AINSWORTH MD, 1989, PHOTOTHERAPY CANC, P37
[3]   The influence of electrode geometry and gas flow on corona-to-glow and glow-to-spark threshold currents in air [J].
Akishev, Y ;
Goossens, O ;
Callebaut, T ;
Leys, C ;
Napartovich, A ;
Trushkin, N .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2001, 34 (18) :2875-2882
[4]   Atmospheric pressure capacitively coupled plasma source for the direct analysis of non-conductive solid samples [J].
Anghel, SD ;
Frentiu, T ;
Cordos, EA ;
Simon, A ;
Popescu, A .
JOURNAL OF ANALYTICAL ATOMIC SPECTROMETRY, 1999, 14 (04) :541-545
[5]  
Angus JohnC., 1986, Plasma deposited thin films: Carbon thin films, P89
[6]   ACETONE CONVERSION IN A LOW-PRESSURE OXYGEN-SURFACE WAVE PLASMA [J].
ARNO, J ;
BEVAN, JW ;
MOISAN, M .
ENVIRONMENTAL SCIENCE & TECHNOLOGY, 1995, 29 (08) :1961-1965
[7]   ELECTRON-CYCLOTRON RESONANCE MICROWAVE DISCHARGES FOR ETCHING AND THIN-FILM DEPOSITION [J].
ASMUSSEN, J .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (03) :883-893
[8]  
BAKKER LP, 2000, THESIS EINDHOVEN U T
[9]   METASTABLE ARGON BEAM SOURCE USING A SURFACE-WAVE SUSTAINED PLASMA [J].
BANNISTER, ME ;
CECCHI, JL .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1994, 12 (01) :106-113
[10]   CAVITY FOR MICROWAVE-INDUCED PLASMAS OPERATED IN HELIUM AND ARGON AT ATMOSPHERIC-PRESSURE [J].
BEENAKKER, CIM .
SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY, 1976, 31 (8-9) :483-486