Growth of epitaxial and oriented K(Ta0.65Nb0.35)O-3 thin films by sol-gel method

被引：5

作者：

Bao, DH ^{[1
]}

Kuang, AX ^{[1
]}

机构：

[1] XIAN JIAOTONG UNIV,ELECT MAT RES LAB,XIAN 710049,PEOPLES R CHINA

来源：

JOURNAL OF CRYSTAL GROWTH | 1997年 / 171卷 / 1-2期

关键词：

D O I：

10.1016/S0022-0248(96)00494-0

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

Epitaxial and oriented K(Ta0.65Nb0.35)O-3 thin films were prepared by the sol-gd method, using metalorganic compounds. The thin films were characterized by X-ray diffraction (XRD), and reflection high energy electron diffraction (RHEED). The mechanism of orientation of the K(Ta0.65Nb0.35)O-3 films is discussed.

引用

页码：314 / 317

页数：4

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