defects;
voids;
ion implantation;
radiation effects;
helium;
silicon;
D O I:
10.1016/S0168-583X(99)00888-5
中图分类号:
TH7 [仪器、仪表];
学科分类号:
0804 ;
080401 ;
081102 ;
摘要:
40 keV He+ ions were implanted into (1 0 0) oriented Si single crystals to a fluence of 9 x 10(15) cm(-2) at room-temperature or 350 degrees C. The implantations were performed at both. random or (0 0 1) Si channel directions. The implantation damage and the in situ annealing effects during the He implantations were investigated by transmission electron microscopy (TEM), Rutherford backscattering/channeling spectrometry (RBS/C) and elastic recoil detection analysis (ERDA). Significant differences in the microstructure evolution between the 350 degrees C and the room-temperature implanted and subsequently annealed at 350 degrees C samples were observed. The results are discussed in terms of a distinct Me bubble nucleation process. (C) 2000 Elsevier Science B.V. All rights reserved.