He-induced cavity formation in silicon upon high-temperature implantation

被引:17
作者
Fichtner, PFP
Peeva, A
Behar, M
Azevedo, GD
Maltez, RL
Koegler, R
Skorupa, W
机构
[1] Univ Fed Rio Grande Sul, Dept Met, BR-91501970 Porto Alegre, RS, Brazil
[2] FWIM, Res Ctr Rossendorf, D-01314 Dresden, Germany
[3] Univ Fed Rio Grande Sul, Inst Fis, BR-91501970 Porto Alegre, RS, Brazil
关键词
defects; voids; ion implantation; radiation effects; helium; silicon;
D O I
10.1016/S0168-583X(99)00888-5
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
40 keV He+ ions were implanted into (1 0 0) oriented Si single crystals to a fluence of 9 x 10(15) cm(-2) at room-temperature or 350 degrees C. The implantations were performed at both. random or (0 0 1) Si channel directions. The implantation damage and the in situ annealing effects during the He implantations were investigated by transmission electron microscopy (TEM), Rutherford backscattering/channeling spectrometry (RBS/C) and elastic recoil detection analysis (ERDA). Significant differences in the microstructure evolution between the 350 degrees C and the room-temperature implanted and subsequently annealed at 350 degrees C samples were observed. The results are discussed in terms of a distinct Me bubble nucleation process. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:1038 / 1042
页数:5
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