Deposition of n-type diamondlike carbon by using the layer-by-layer technique and its electron emission properties

被引：26

作者：

Park, KC

Moon, JH

Chung, SJ

Jang, J

Oh, MH

Milne, WI

机构：

[1] KOREA ADV INST SCI & TECHNOL,SEOUL,SOUTH KOREA

[2] UNIV CAMBRIDGE,CAMBRIDGE CB2 1PZ,ENGLAND

来源：

APPLIED PHYSICS LETTERS | 1997年 / 70卷 / 11期

关键词：

D O I：

10.1063/1.119076

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We have studied the electron emission behavior of the diamondlike carbon (DLC) films by plasma enhanced chemical vapor deposition using a layer-by-layer deposition, in which the deposition of a thin layer of DLC and a CF4 plasma exposure on its surface were carried out alternatively. The electron emission current increases with CF4 plasma exposure time. The increase in emission current appears to be due to the It-type behavior of the DLC. (C) 1997 American Institute of Physics.

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页码：1381 / 1383

页数：3

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