Mechanism for the destruction of carbon tetrachloride and chloroform DNAPLs by modified Fenton's reagent

被引:64
作者
Smith, Brant A. [1 ]
Teel, Amy L. [1 ]
Watts, Richard J. [1 ]
机构
[1] Washington State Univ, Dept Civil & Environm Engn, Pullman, WA 99164 USA
关键词
DNAPLs; carbon tetrachloride; chloroform; in situ chemical oxidation; Fenton's reagent; superoxide; hydroxyl radical;
D O I
10.1016/j.jconhyd.2006.02.002
中图分类号
X [环境科学、安全科学];
学科分类号
08 ; 0830 ;
摘要
The destruction of a carbon tetrachloride DNAPL and a chloroform DNAPL was investigated in reactions containing 0.5 mL of DNAPL and a solution of modified Fenton's reagent (2M H2O2 and 5 mM iron(III)-chelate). Carbon tetrachloride and chloroform masses were followed in the DNAPLs, the aqueous phases, and the off gasses. In addition, the rate of DNAPL destruction was compared to the rate of gas-purge dissolution. Carbon tetrachloride DNAPLs were rapidly destroyed by modified Fenton's reagent at 6.5 times the rate of gas purge dissolution, with 74% of the DNAPL destroyed within 24 h. Use of reactions in which a single reactive oxygen species (hydroxyl radical, hydroperoxide anion, or superoxide radical anion) was generated showed that superoxide is the reactive species in modified Fenton's reagent responsible for carbon tetrachloride DNAPL destruction. Chloroform DNAPLs were also destroyed by modified Fenton's reagent, but at a rate slower than the rate of gas purge dissolution. Reactions generating a single reactive oxygen species demonstrated that chloroform destruction was the result of both superoxide and hydroxyl radical activity. Such a mechanism of chloroform DNAPL destruction is in agreement with the slow but relatively equal reactivity of chloroform with both superoxide and hydroxyl radical. The results of this research demonstrate that modified Fenton's reagent can rapidly and effectively destroy DNAPLs of contaminants characterized by minimal reactivity with hydroxyl radical, and should receive more consideration as a DNAPL cleanup technology. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:229 / 246
页数:18
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