Integration of GaN thin films with dissimilar substrate materials by Pd-In metal bonding and laser lift-off

被引:55
作者
Wong, WS [1 ]
Wengrow, AB
Cho, Y
Salleo, A
Quitoriano, NJ
Cheung, NW
Sands, T
机构
[1] Univ Calif Berkeley, Dept Mat Sci & Mineral Engn, Berkeley, CA 94720 USA
[2] Univ Calif Berkeley, Appl Sci & Technol Grad Grp, Berkeley, CA 94720 USA
[3] Univ Calif Berkeley, Dept Elect Engn & Comp Sci, Berkeley, CA 94720 USA
基金
美国国家科学基金会;
关键词
gallium nitride (GaN); laser lift-off; low-temperature wafer bonding; laser processing; silicon (Si); gallium arsenide (GaAs); polymers;
D O I
10.1007/s11664-999-0131-x
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Gallium nitride (GaN) thin films grown on sapphire substrates were successfully bonded and transferred onto GaAs, Si, and polymer "receptor" substrates using a low-temperature Pd-In bond followed by a laser lift-off (LLO) process to remove the sapphire growth substrate. The GaN/sapphire structures were joined to the receptor substrate by pressure bonding a Pd-In bilayer coated GaN surface onto a Pd coated receptor substrate at a temperature of 200 degrees C. X-ray diffraction showed that the intermetallic compound PdIn(3) had formed during the bonding process. LLO, using a single 600 mJ/cm(2), 38 ns KrF (248 nm) excimer laser pulse directed through the transparent sapphire substrate, followed by a low-temperature heat treatment, completed the transfer of the GaN onto the "receptor" substrate. Cross-sectional scanning electron microscopy and x-ray rocking curves showed that the film quality did not degrade significantly during the bonding and LLO process.
引用
收藏
页码:1409 / 1413
页数:5
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