Spectroscopic ellipsometry of epitaxial ZnO layer on sapphire substrate

被引:122
作者
Postava, K
Sueki, H
Aoyama, M
Yamaguchi, T
Ino, C
Igasaki, Y
Horie, M
机构
[1] Shizuoka Univ, Elect Res Inst, Hamamatsu, Shizuoka 4328011, Japan
[2] Dainippon Screen Mfg Co Ltd, Res Lab, Kyoto 6028585, Japan
关键词
D O I
10.1063/1.373461
中图分类号
O59 [应用物理学];
学科分类号
摘要
Optical properties of epitaxial ZnO layers have been studied in the spectral region from 1.5 to 5.4 eV using four-zone null spectroscopic ellipsometry. An existing model dielectric function based on excitonic structure near direct band gap has been improved by including a high-energy absorption term. Surface layer, corresponding to the surface roughness, was found to be essential to fit the spectroellipsometric data obtained. Two kinds of samples have been studied: ZnO layers prepared on (0001) and (11 (2) over bar 0)- oriented sapphire substrates. The surfaces of the first ones were found to be more rough. (C) 2000 American Institute of Physics. [S0021-8979(00)01911-3].
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收藏
页码:7820 / 7824
页数:5
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