High resolution phosphor screening method for full-color field emission display applications

被引：25

作者：

Jang, JE ^{[1
]}

Gwak, JH ^{[1
]}

Jin, YW ^{[1
]}

Lee, SJ ^{[1
]}

Park, SH ^{[1
]}

Jung, JE ^{[1
]}

Lee, NS ^{[1
]}

Kim, JM ^{[1
]}

机构：

[1] Samsung Adv Inst Technol, Display Lab, Mat & Device Sector, Suwon 440600, South Korea

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2000年 / 18卷 / 02期

关键词：

D O I：

10.1116/1.591339

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A polyvinyl alcohol-slurry screening technology of phosphors was studied for field emission displays with a resolution up to supervideo graphics adapter. Phosphor lines were successfully patterned as narrow as 25 mu m on 6 in. glass substrates. Process conditions such as spin coating speeds, exposure time, and shadow mask layout for photolithography were related to thickness and line resolutions of phosphor. Luminance characteristics of phosphors were optimized in terms of firing processes. For ZnS:Cu, Al, ZnS:Ag, Cl, and Y2O3:Eu phosphors, the firing temperature was optimized to be 400 degrees C. The nitrogen ambient during the cooling process improves the stability of phosphor surface. (C) 2000 American Vacuum Society. [S0734-211X(00)04102-0].

引用

页码：1106 / 1110

页数：5

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