Detection of CN radicals in DC nitrogen plasma used for deposition of CNx layers

被引：19

作者：

Nemes, L

Mohai, M

Donkó, Z

Bertóti, I

机构：

[1] Hungarian Acad Sci, Chem Res Ctr, Res Lab Mat & Environm Chem, H-1525 Budapest, Hungary

[2] Hungarian Acad Sci, Cent Res Inst Phys, Res Inst Solid State Phys & Opts, H-1525 Budapest, Hungary

来源：

SPECTROCHIMICA ACTA PART A-MOLECULAR AND BIOMOLECULAR SPECTROSCOPY | 2000年 / 56卷 / 04期

基金：

匈牙利科学研究基金会;

关键词：

DC plasma; emission spectra; CN radicals; CNx layers;

D O I：

10.1016/S1386-1425(99)00159-6

中图分类号：

O433 [光谱学];

学科分类号：

0703 ; 070302 ;

摘要：

Emission spectra from a DC plasma discharge of nitrogen with a graphite cathode used for deposition of CNx layers were investigated in the visible range 350-900 nm. The spectra recorded at low and high resolution from both the negative glow and the positive column of the discharge were studied separately. All spectra are dominated by neutral and ionised N-2 emission. In the positive column the violet band of the cyanogen (CN) radical was identified and analysed for vibrational structure. From a computer simulation of the rotationally resolved violet band, vibrational temperatures were derived and found to be in the intensity distribution for the upsilon = 0, 1 and 2 levels from thermal equilibrium. In the negative glow the strong N-2(+) features completely mask the spectral region of the violet band of CN. Conclusions were drawn concerning the CN formation by chemical sputtering, and the role of CN radicals in the formation of polymeric CNx layers of 1:1 = C:N stoichiometry. (C) 2000 Elsevier Science B.V. All rights reserved.

引用

页码：761 / 767

页数：7

共 13 条

[1] Spectroscopic studies during pulsed laser ablation deposition of C-N films [J].