Polymorphous silicon:: Transport properties and solar cell applications

Transport properties of hydrogenated polymorphous silicon layers (pm-Si:H) deposited at 150 degrees C under various pressures in the range 80-293 Pa in sandwich (Schottky and p-i-n diodes) and coplanar structures have been compared to those of hydrogenated amorphous silicon (a-Si:H) samples deposited at the same temperature in standard conditions. The layers have been studied as-deposited, annealed and after light-soaking. With increasing pressure up to 240 Pa: i) the density of states above the Fermi level decreases as determined by means of the modulated photocurrent technique, ii) the mobility-lifetime products of electrons and holes measured by means of steady-state photoconductivity and photocarrier grating techniques both increase. The highest values for the diffusion length of minority carriers exceed 200 nm. Capacitance measurements as a function of frequency and temperature show that the density of states at the Fermi level is lower in the pm-Si:H than in the a-Si:H films. After light-soaking the diffusion length of minority carriers in a-Si:H is reduced by a factor of two whereas it is less reduced or not affected in the pm-Si:H layers. Solar cells including this new material present an excellent stability.