Comparison of filtered high-current pulsed arc deposition (φ-HCA) with conventional vacuum arc methods

Special features of the filtered high-current pulsed are deposition (phi-HCA) are presented in comparison with the conventional de-are method. The high-current are technique allows pulse currents of some kiloamperes and averaged are currents of approximately 1 kA. Due to the high spot velocity the droplet density is already markedly reduced. The remaining particles may be completely eliminated by combination with a magnetic filter. The optimum design of this device together with the high efficiency of the pulsed are source yields ion currents at the filter exit above 100 A during a pulsed are and above 10-A averaged current. High quality films with deposition rates of industrial relevance may be produced by advanced are techniques. Various coatings such as metal refractory nitrides, oxides and hard coatings are investigated and compared with the conventional de-are deposition. It is shown that the phi-HCA module is a promising supplementary device that can be attached to industrial standard equipment for Various applications demanding smooth mirror-like metallic hard coatings. (C) 2000 Elsevier Science S.A. All rights reserved.