Twofold spatial resolution enhancement by two-photon exposure of photographic film

被引：22

作者：

Korobkin, DV ^{[1
]}

Yablonovitch, E ^{[1
]}

机构：

[1] Univ Calif Los Angeles, Dept Elect Engn, Los Angeles, CA 90025 USA

来源：

OPTICAL ENGINEERING | 2002年 / 41卷 / 07期

关键词：

photolithography; two-photon absorption;

D O I：

10.1117/1.1479706

中图分类号：

O43 [光学];

学科分类号：

070207 [光学]; 0803 [光学工程];

摘要：

Two-photon absorption of photosensitive media can produce interference fringes with double spatial frequency. This requires the employment of multiple-frequency beams, which interfere with one another to produce a stationary image with double spatial resolution. The required beams were produced by frequency filtering of broadband radiation from a cw mode-locked femtosecond Ti:sapphire laser (lambda = 790 nm) in a dispersion-free pulse shaper. Then the two multifrequency rays converged from opposite edges of a lens, focusing on Kodak commercial film. The laser intensity was high enough to produce a two-photon exposure. The doubling of the spatial frequency of the interference pattern has been observed, but the contrast ratio of the pattern was limited by competition from the more usual one-photon absorption. Laser pulse parameters for a single-pulse two-photon exposure have been estimated. (C) 2002 Society of Photo-Optical Instrumentation Engineers.

引用

页码：1729 / 1732

页数：4

共 8 条

[1]

Quantum interferometric optical lithography: Exploiting entanglement to beat the diffraction limit [J].

Boto, AN ;

Kok, P ;

Abrams, DS ;

Braunstein, SL ;

Williams, CP ;

Dowling, JP .

PHYSICAL REVIEW LETTERS, 2000, 85 (13) :2733-2736

[2]

Interferometric lithography - from periodic arrays to arbitrary patterns [J].

Brueck, SRJ ;

Zaidi, SH ;

Chen, X ;

Zhang, Z .

MICROELECTRONIC ENGINEERING, 1998, 42 :145-148

[3]

NEGATIVE DISPERSION USING PAIRS OF PRISMS [J].

FORK, RL ;

MARTINEZ, OE ;

GORDON, JP .

OPTICS LETTERS, 1984, 9 (05) :150-152

[4]

Three-dimensional microfabrication with two-photon-absorbed photopolymerization [J].

Maruo, S ;

Nakamura, O ;

Kawata, S .

OPTICS LETTERS, 1997, 22 (02) :132-134

[5]

HIGH-RESOLUTION FEMTOSECOND PULSE SHAPING [J].

WEINER, AM ;

HERITAGE, JP ;

KIRSCHNER, EM .

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B-OPTICAL PHYSICS, 1988, 5 (08) :1563-1572

[6]

Single-shot two-photon exposure of commercial photoresist for the production of three-dimensional structures [J].

Witzgall, G ;

Vrijen, R ;

Yablonovitch, E ;

Doan, V ;

Schwartz, BJ .

OPTICS LETTERS, 1998, 23 (22) :1745-1747

[7]

Two-photon exposure of photographic film [J].

Wu, PW ;

Dunn, B ;

Yablonovitch, E ;

Doan, V ;

Schwartz, BJ .

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B-OPTICAL PHYSICS, 1999, 16 (04) :605-608

[8]

Optical projection lithography at half the Rayleigh resolution limit by two-photon exposure [J].

Yablonovitch, E ;

Vrijen, RB .

OPTICAL ENGINEERING, 1999, 38 (02) :334-338

← 1 →