Interferometric lithography - from periodic arrays to arbitrary patterns

Interferometric lithography is a simple technology for the production of very small features. Using I-line wavelength laser sources (364-Mm Ar-ion or 355-nm tripled. YAG lasers) dense (1:1 line:space ratio) periodic structures at 0.125-mu m have been demonstrated. Mix-and-match with optical lithography has been demonstrated. Imaging interferometric lithography, a true integration between optical and interferometric lithographies, potentially provides a route to arbitrary structures with a resolution up to 130 mm (dense patterns) at I-line and 65 nm at a 193 nm exposure wavelength.