Metal pattern fabrication using the local electric field of a conducting atomic force microscope probe
被引:28
作者:
Brandow, SL
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h-index: 0
机构:
USN, RES LAB, DIV ELECT SCI & TECHNOL, WASHINGTON, DC 20375 USAUSN, RES LAB, DIV ELECT SCI & TECHNOL, WASHINGTON, DC 20375 USA
Brandow, SL
[1
]
Calvert, JM
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h-index: 0
机构:
USN, RES LAB, DIV ELECT SCI & TECHNOL, WASHINGTON, DC 20375 USAUSN, RES LAB, DIV ELECT SCI & TECHNOL, WASHINGTON, DC 20375 USA
Calvert, JM
[1
]
Snow, ES
论文数: 0引用数: 0
h-index: 0
机构:
USN, RES LAB, DIV ELECT SCI & TECHNOL, WASHINGTON, DC 20375 USAUSN, RES LAB, DIV ELECT SCI & TECHNOL, WASHINGTON, DC 20375 USA
Snow, ES
[1
]
Campbell, PM
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h-index: 0
机构:
USN, RES LAB, DIV ELECT SCI & TECHNOL, WASHINGTON, DC 20375 USAUSN, RES LAB, DIV ELECT SCI & TECHNOL, WASHINGTON, DC 20375 USA
Campbell, PM
[1
]
机构:
[1] USN, RES LAB, DIV ELECT SCI & TECHNOL, WASHINGTON, DC 20375 USA
来源:
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
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1997年
/
15卷
/
03期
关键词:
D O I:
10.1116/1.580561
中图分类号:
TB3 [工程材料学];
学科分类号:
0805 ;
080502 ;
摘要:
Two approaches were developed using an ambient atomic force microscope (AFM) to pattern metal in either positive or negative tone. The difference in surface chemical reactivity between exposed and unexposed regions was used to selectively attach colloidal Pd(II) nanoparticles capable of initiating the deposition of electroless (EL) Ni. In one case, EL Ni was selectively deposited in the unexposed regions of an organosilane film. In the second case, EL Ni was selectively deposited directly on an AFM oxide pattern. Based on the different binding selectivities of the Pd(II) catalysts, selective deposition on AFM patterns was attributed to the presence of a carbon residue in AFM oxide patterns formed under ambient conditions. The patterned Ni films were used as a mask for pattern transfer into the underlying substrate by reactive ion etching. (C) 1997 American Vacuum Society.