Corrosion behavior of nitrogen doped diamond-like carbon thin films in NaCl solutions

被引：84

作者：

Khun, N. W. ^{[1
]}

Liu, E. ^{[1
]}

Zeng, X. T. ^{[2
]}

机构：

[1] Nanyang Technol Univ, Sch Mech & Aerosp Engn, Singapore 639798, Singapore

[2] Singapore Inst Mfg Technol, Singapore 638075, Singapore

来源：

CORROSION SCIENCE | 2009年 / 51卷 / 09期

关键词：

Sputtered film; Polarization; Corrosion; PROTECTIVE LAYER; SURFACE-ANALYSIS; SI; BIOREACTIONS; VOLTAMMETRY; PERFORMANCE; COATINGS;

D O I：

10.1016/j.corsci.2009.05.050

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Nitrogen doped tetrahedral amorphous carbon (ta-C:N) thin films were grown on p-Si(1 1 1) substrates using filtered cathodic vacuum arc (FCVA) deposition by varying nitrogen flow rate. The effect of nitrogen flow rate on the corrosion performance of the films was investigated through potentiodynamic polarization and immersion tests in 0.6 M NaCl solutions. The polarization results showed that the corrosion resistance of the films dropped with increased nitrogen flow rate due to formation of more sp(2) bonds. The immersion tests revealed that the pH value of the solutions had a significant effect on the corrosion behavior of the ta-C:N films. (C) 2009 Elsevier Ltd. All rights reserved.

引用

页码：2158 / 2164

页数：7

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