Comparison of deposition methods for ultra thin DLC overcoat film for MR head

被引:45
作者
Akita, N
Konishi, Y
Ogura, S
Imamura, M
Hu, YH
Shi, X
机构
[1] Shimadzu Co Ltd, Ind Machinery Div, Kanazawa, Ishikawa, Japan
[2] Nanofilm Technol Int PTE Ltd, Singapore, Singapore
关键词
diamond-like carbon; tetrahedral amorphous carbon; adhesion; photo-electron spectroscopy;
D O I
10.1016/S0925-9635(00)00487-8
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
To improve overcoat films for giant magnetoresistive (GMR) heads, we developed a commercial multi-film deposition system capable of performing three diamond-like carbon (DLC) deposition methods, i.e. electron cyclotron resonance-chemical vapor deposition (ECR-CVD), ion beam deposition (IBD), and filtered cathodic vacuum are (FCVA); pre-cleaning with Ar sputtering etch; and Si adhesion layer deposition. In comparative evaluations of 50-nm-thick films deposited on a Si wafer, ta-C film by FCVA shows higher hardness/density compared to DLC films by ECR-CVD or IBD. Scratch testing and electron spectroscopy for chemical analysis (ESCA) measurements of films prepared by ECR-CVD and FCVA on an Al2O3TiC substrate indicate that substrate bias enhances mixing between the carbon film and either the Si film or Al2O3TiC substrate such that good adhesion occurs. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:1017 / 1023
页数:7
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