Enhanced self-diffusion on Cu(111) by trace amounts of S: Chemical-reaction-limited kinetics

被引：54

作者：

Ling, WL ^{[1
]}

Bartelt, NC ^{[1
]}

Pohl, K ^{[1
]}

de la Figuera, J ^{[1
]}

Hwang, RQ ^{[1
]}

McCarty, KF ^{[1
]}

机构：

[1] Sandia Natl Labs, Livermore, CA 94551 USA

来源：

PHYSICAL REVIEW LETTERS | 2004年 / 93卷 / 16期

关键词：

D O I：

10.1103/PhysRevLett.93.166101

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

We find that less than 0.01 monolayer of S can enhance surface self-diffusion on Cu(111) by several orders of magnitude. The measured dependence of two-dimensional island decay rates on S coverage (theta(S)) is consistent with the proposal that Cu3S3 clusters are responsible for the enhancement. Unexpectedly, the decay and ripening are diffusion limited with very low and very high theta(S) but not for intermediate theta(S). To explain this result we propose that surface mass transport in the intermediate region is limited by the rate of reaction to form Cu3S3 clusters on the terraces.

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页码：166101 / 1

页数：4

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