Physical investigations of DC magnetron sputtered indium tin oxide films

被引：21

作者：

Uthanna, S

Reddy, PS

Naidu, BS

Reddy, PJ

机构：

[1] Department of Physics, Tirupati-517 502, S V University

来源：

VACUUM | 1996年 / 47卷 / 01期

关键词：

D O I：

10.1016/0042-207X(95)00199-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Indium tin oxide films were prepared using the DC magnetron reactive sputtering technique onto Coming glass substrates by controlling the deposition parameters. The films were characterised by studying their composition and structure, and electrical and optical properties. The low resistive and high transparent films were generated at 2.4 mTorr of oxygen by maintaining the substrate temperature at 473 K.

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页码：91 / 93

页数：3

相关论文

共 17 条

[1]

BOSNELL JR, 1973, THIN SOLID FILMS, V15, P161

[2] THE INFLUENCE OF TARGET OXIDATION AND GROWTH-RELATED EFFECTS ON THE ELECTRICAL-PROPERTIES OF REACTIVELY SPUTTERED FILMS OF TIN-DOPED INDIUM OXIDE [J].

BUCHANAN, M ;

WEBB, JB ;

WILLIAMS, DF .

THIN SOLID FILMS, 1981, 80 (04) :373-382

[3] EXCIMER LASER-INDUCED DEPOSITION OF INP AND INDIUM-OXIDE FILMS [J].

DONNELLY, VM ;

GEVA, M ;

LONG, J ;

KARLICEK, RF .

APPLIED PHYSICS LETTERS, 1984, 44 (10) :951-953

[4] OPTICAL-PROPERTIES OF TRANSPARENT AND HEAT-REFLECTING INDIUM TIN OXIDE-FILMS - THE ROLE OF IONIZED IMPURITY SCATTERING [J].

HAMBERG, I ;

GRANQVIST, CG .

APPLIED PHYSICS LETTERS, 1984, 44 (08) :721-723

[5] DC MAGNETRON REACTIVELY SPUTTERED INDIUM-TIN-OXIDE FILMS PRODUCED USING ARGON-OXYGEN-HYDROGEN MIXTURES [J].

HARDING, GL ;

WINDOW, B .

SOLAR ENERGY MATERIALS, 1990, 20 (5-6) :367-379

[6] IMPROVEMENT IN THE UNIFORMITY OF RESISTIVITY IN A MAGNETRON-SPUTTERED INDIUM TIN OXIDE FILM BY CONTROLLING THE PLASMA FLUX DISTRIBUTION [J].

ICHIHARA, K ;

OKUBO, M .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (7B) :4478-4481

[7] DIRECT-CURRENT MAGNETRON-SPUTTERED IN2O3 FILMS AS TUNNEL BARRIERS [J].

KASIVISWANATHAN, S ;

RANGARAJAN, G .

JOURNAL OF APPLIED PHYSICS, 1994, 75 (05) :2572-2577

[8]

KITTLER WC, 1982, P SOC PHOTO-OPT INST, V325, P61, DOI 10.1117/12.933287

[9] ELECTRICAL, OPTICAL AND CHEMICAL-PROPERTIES OF INDIUM TIN OXIDIZED FILMS GROWN BY SEQUENTIAL ELECTRON-BEAM DEPOSITION OF INDIUM AND TIN [J].

KULKARNI, AK ;

KNICKERBOCKER, SA .

THIN SOLID FILMS, 1992, 220 (1-2) :321-326

[10] LOW-PRESSURE AND TEMPERATURE DEPOSITION OF TRANSPARENT CONDUCTIVE INDIUM TIN OXIDE (ITO) FILMS BY THE FACE TARGET SPUTTERING (FTS) PROCESS [J].

LEE, WK ;

MACHINO, T ;

SUGIHARA, T .

THIN SOLID FILMS, 1993, 224 (01) :105-111