Potential of dry etching for the fabrication of fused silica micro-optical elements

被引：5

作者：

Nussbaum, P ^{[1
]}

Weible, KJ ^{[1
]}

Rossi, M ^{[1
]}

Herzig, HP ^{[1
]}

机构：

[1] Univ Neuchatel, Inst Microtechnol, CH-2000 Neuchatel, Switzerland

来源：

MICROMACHINE TECHNOLOGY FOR DIFFRACTIVE AND HOLOGRAPHIC OPTICS | 1999年 / 3879卷

关键词：

micro-optical elements; microfabrication; dry etching; fused silica;

D O I：

10.1117/12.360533

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We report on recent progress in the fabrication of fused silica micro-optical elements, such as blazed gratings, refractive microlenses and microprisms. The elements are first made in photoresist and then they are transferred into fused silica by reactive ion etching. High selectivity etching is needed to realize structures with a high aspect ratio. Results are shown using various metallic etch masks. The shaping of optimized profiles is also presented to generate microlenses which are aspheric, or which have a low numerical aperture.

引用

页码：63 / 70

页数：4

共 8 条

[1]

Bhardwaj JK, 1995, P SOC PHOTO-OPT INS, V2639, P224, DOI 10.1117/12.221279

[2]

DASCHNER W, 1996, J VAC SCI TECHNOL B, V14, P135

[3]

GALE MT, 1997, MICROOPTICS ELEMENTS, pCH4

[4] Fabrication of microprisms for planar optical interconnections by use of analog gray-scale lithography with high-energy-beam-sensitive glass [J].

Gimkiewicz, C ;

Hagedorn, D ;

Jahns, J ;

Kley, EB ;

Thoma, F .

APPLIED OPTICS, 1999, 38 (14) :2986-2990

[5]

Herzig H.P., 1997, Micro-optics: Elements, Systems, and Applications

[6] Design, fabrication and testing of microlens arrays for sensors and microsystems [J].

Nussbaum, P ;

Volke, R ;

Herzig, HP ;

Eisner, M ;

Haselbeck, S .

PURE AND APPLIED OPTICS, 1997, 6 (06) :617-636

[7]

Pang S., 1997, HDB MICROLITHOGRAPHY, V2, P99

[8] TECHNIQUE FOR MONOLITHIC FABRICATION OF MICROLENS ARRAYS [J].

POPOVIC, ZD ;

SPRAGUE, RA ;

CONNELL, GAN .

APPLIED OPTICS, 1988, 27 (07) :1281-1284

← 1 →