Ion and neutral temperatures in a novel ultrahigh-frequency discharge plasma

被引:16
作者
Nakano, T [1 ]
Ohtake, H [1 ]
Samukawa, S [1 ]
机构
[1] NEC CORP LTD,MICROELECTR RES LABS,LSI BASIC RES LAB,TSUKUBA,IBARAKI 305,JAPAN
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1996年 / 35卷 / 3A期
关键词
UHF plasma; spokewise antenna; laser-induced fluorescence; ion temperature; neutral temperature;
D O I
10.1143/JJAP.35.L338
中图分类号
O59 [应用物理学];
学科分类号
摘要
Ion and neutral temperatures are measured in an ultrahigh-frequency discharge plasma through Ar and Ne by Doppler-shifted laser-induced fluorescence. The ion and neutral temperatures are estimated to be approximate to 0.066 eV (770 K) for Ar+ and 0.033 +/- 0.004 eV (380 +/- 50 K) for Ne, respectively. These temperatures are lower than those reported for electron cyclotron resonance and helicon wave plasmas. The low temperatures are attributed to the low electron temperature (approximate to 2 eV) and excellent uniformity of the UHF plasma.
引用
收藏
页码:L338 / L340
页数:3
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