Energetics and diffusion of hydrogen in SiO2

被引:60
作者
Tuttle, B [1 ]
机构
[1] Univ Illinois, Beckman Inst, Urbana, IL 61801 USA
来源
PHYSICAL REVIEW B | 2000年 / 61卷 / 07期
关键词
D O I
10.1103/PhysRevB.61.4417
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We explore the energetics and migration of neutral hydrogen in SiO2 using ab initio density-functional calculations. From static minimizations (T = 0), we have calculated the formation energy and the adiabatic potential-energy surface of hydrogen in bulk SiO2. Using our T = 0 results, we employ classical transition state theory to derive the temperature dependent diffusivity: D(T) = (8.1 x 10(-3) cm(2)/sec)exp(-0.2 eV/kT). This result is in good agreement with our molecular-dynamic simulations at T = 600 K, and agrees reasonably with recent experiments.
引用
收藏
页码:4417 / 4420
页数:4
相关论文
共 31 条
[1]   1ST-PRINCIPLES CALCULATIONS OF DIFFUSION-COEFFICIENTS - HYDROGEN IN SILICON [J].
BLOCHL, PE ;
VAN DE WALLE, CG ;
PANTELIDES, ST .
PHYSICAL REVIEW LETTERS, 1990, 64 (12) :1401-1404
[2]   Hydrogen electrochemistry and stress-induced leakage current in silica [J].
Blöchl, PE ;
Stathis, JH .
PHYSICAL REVIEW LETTERS, 1999, 83 (02) :372-375
[3]  
BORNGIORNO A, 1996, MATER RES SOC S P, V408, P518
[4]  
BORNGIORNO A, 1997, J NONCRYST SOLIDS, V216, P30
[5]   KINETICS OF H-2 PASSIVATION OF PB CENTERS AT THE (111) SI-SIO2 INTERFACE [J].
BROWER, KL .
PHYSICAL REVIEW B, 1988, 38 (14) :9657-9666
[6]   ATOMIC HYDROGEN-INDUCED DEGRADATION OF THIN SIO2 GATE OXIDES [J].
CARTIER, E ;
BUCHANAN, DA ;
STATHIS, JH ;
DIMARIA, DJ .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1995, 187 :244-247
[7]   BASIS-SET-FREE LOCAL DENSITY-FUNCTIONAL CALCULATIONS OF GEOMETRIES OF POLYATOMIC-MOLECULES [J].
DICKSON, RM ;
BECKE, AD .
JOURNAL OF CHEMICAL PHYSICS, 1993, 99 (05) :3898-3905
[9]   Giant isotope effect in hot electron degradation of metal oxide silicon devices [J].
Hess, K ;
Kizilyalli, IC ;
Lyding, JW .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1998, 45 (02) :406-416
[10]  
HOHENBERG P, 1964, PHYS REV, V136, pB869