Gas temperature gradients in a CF4 inductive discharge

被引:62
作者
Abada, H [1 ]
Chabert, P
Booth, JP
Robiche, J
Cartry, G
机构
[1] Ecole Polytech, Lab Phys & Technol Plasmas, F-91128 Palaiseau, France
[2] Inst Mat Nantes, Lab Plasmas & Couches Minces, F-44322 Nantes, France
关键词
D O I
10.1063/1.1505683
中图分类号
O59 [应用物理学];
学科分类号
摘要
The neutral gas temperature in a CF4 planar inductive discharge was measured with space and time resolution using laser-induced fluorescence of the CF radical with analysis of the rotationally resolved excitation spectra. Strong temperature gradients are observed and temperatures as high as 900 K are reached at the reactor center at 50 mTorr with a power density of 0.15 W/cm(3). The temperature at the reactor center increases with both gas pressure and power, but is independent of the gas flow rate. A simple model based on the global thermal energy balance is proposed to explain these results. The fraction of the injected rf power consumed in gas heating varies from 4.4% to 42% under our conditions (5-50 mTorr, 250 W rf power). Axial temperature profiles were measured in the steady state and in the time afterglow. The typical temperature relaxation times are several hundreds of microseconds. A numerical two-dimensional, time-dependent thermal model is in good agreement with the results. (C) 2002 American Institute of Physics.
引用
收藏
页码:4223 / 4230
页数:8
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