Nanoscale atomic lithography with a cesium atom beam

被引：61

作者：

Lison, F ^{[1
]}

Adams, HJ ^{[1
]}

Haubrich, D ^{[1
]}

Kreis, M ^{[1
]}

Nowak, S ^{[1
]}

Meschede, D ^{[1
]}

机构：

[1] UNIV KONSTANZ,FAK PHYS,D-78457 CONSTANCE,GERMANY

来源：

APPLIED PHYSICS B-LASERS AND OPTICS | 1997年 / 65卷 / 03期

关键词：

D O I：

10.1007/s003400050290

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We have demonstrated the lithographic production of a periodic nanostructure by focusing a transversely laser cooled cesium atomic beam with a standing-wave light field. With a self-assembled monolayer used as the resist on a gold surface, exposure to cesium atoms locally changes the wetability. Subsequently a wet-etching process transfers the pattern to the underlying gold film. We have generated lines with a separation of half the wavelength of the cesium D-2 line (852 nm) and a width of about 120 nm and covering a large area of approximately 1 mm(2).

引用

页码：419 / 421

页数：3

共 18 条

[1]

Berggren KK, 1997, ADV MATER, V9, P52

[2] MICROLITHOGRAPHY BY USING NEUTRAL METASTABLE ATOMS AND SELF-ASSEMBLED MONOLAYERS [J].