Characterization of metal/GaN Schottky interfaces based on I-V-T characteristics

被引:43
作者
Sawada, T
Ito, Y
Kimura, N
Imai, K
Suzuki, K
Sakai, S
机构
[1] Hokkaido Inst Technol, Dept Elect & Elect Engn, Sapporo, Hokkaido 0068585, Japan
[2] Univ Tokushima, Dept Elect & Elect Engn, Tokushima 7708506, Japan
关键词
GaN Schottky; Schottky barrier height; I-V-T characteristics; C-V; interface Fermi level;
D O I
10.1016/S0169-4332(01)00904-7
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Interface properties of metal/n- and p-GaN Schottky diodes are studied by I-V-T and C-V-T measurements, and simulation of their characteristics. On the basis of the previously pro-posed "surface patch" model, the gross behavior of I-V-T characteristics, which includes Richardson plots together with temperature dependence of the effective Schottky barrier heights (SBHs) and n-values, can be well reproduced. Furthermore, the dependence of the true SBH on the metal work function was also deduced from high-temperature I-V curves, giving S-values of 0.28 and 0.20 for n- and p-GaN samples, respectively, and the interface Fermi level tends to be pinned at a characteristic energy of about two-third of the bandgap. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:326 / 329
页数:4
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