ELECTRON-TRANSPORT AT METAL-SEMICONDUCTOR INTERFACES - GENERAL-THEORY

被引:1409
作者
TUNG, RT
机构
关键词
D O I
10.1103/PhysRevB.45.13509
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A dipole-layer approach is presented, which leads to analytic solutions to the potential and the electronic transport at metal-semiconductor interfaces with arbitrary Schottky-barrier-height profiles. The presence of inhomogeneities in the Schottky-barrier height is shown to lead to a coherent explanation of many anomalies in the experimental results. These results suggest that the formation mechanism of the Schottky barrier is locally nonuniform at common, polycrystalline, metal-semiconductor interfaces.
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页码:13509 / 13523
页数:15
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