ELECTRICAL CHARACTERISTICS OF TI/SI(100) INTERFACES

被引：42

作者：

ABOELFOTOH, MO ^{[1
]}

机构：

[1] ROYAL INST TECHNOL,DEPT SOLID STATE ELECTR,S-10044 STOCKHOLM 70,SWEDEN

来源：

JOURNAL OF APPLIED PHYSICS | 1988年 / 64卷 / 08期

关键词：

D O I：

10.1063/1.341338

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

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页码：4046 / 4055

页数：10

相关论文

共 37 条

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