SiC and Si3N4 inclusions in multicrystalline silicon ingots

被引:68
作者
Soiland, AK [1 ]
Ovrelid, EJ
Engh, TA
Lohne, O
Tuset, JK
Gjerstad, O
机构
[1] Norwegian Univ Sci & Technol, Dept Mat Technol, NO-7491 Trondheim, Norway
[2] SINTEF, NO-7465 Trondheim, Norway
[3] ScanWafer ASA, NO-1323 Hovik, Norway
关键词
multicrystalline Si; inclusions; SiC; Si3N4;
D O I
10.1016/j.mssp.2004.05.001
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this study we have investigated inclusions present in certain areas of a multicrystalline silicon ingot cast in industry. The inclusions were retrieved from the matrix by dissolution in HF:HNO3, followed by filtration. We identified the inclusions as beta-SiC and beta-Si3N4 by using Electron Probe Microanalyzer and Electron Backscatter Diffraction. These inclusions appear to a great extent as large clusters consisting of both types of particles. We also obtained a particle size distribution giving the following diameter range; 75 mum < 80 mass% < 385 mum. As the carbide particles tend to grow on the nitrides, the latter seem to act as nucleating centers for carbide precipitation. Several of the analyzed parts resulted in no measurable content by this method, indicating an inhomogeneous distribution. (C) 2004 Elsevier Ltd. All rights reserved.
引用
收藏
页码:39 / 43
页数:5
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