Thin film silicon photovoltaics: Architectural perspectives and technological issues

被引：58

作者：

Mercaldo, Lucia Vittoria ^{[1
]}

Addonizio, Maria Luisa ^{[1
]}

Della Noce, Marco ^{[1
]}

Veneri, Paola Delli ^{[1
]}

Scognamiglio, Alessandra ^{[1
]}

Privato, Carlo ^{[1
]}

机构：

[1] ENEA, Portici Res Ctr, I-80055 Naples, Italy

来源：

APPLIED ENERGY | 2009年 / 86卷 / 10期

关键词：

Renewable energy; Thin film silicon photovoltaics; Building integrated photovoltaics; Micromorph solar cells; SOLAR-CELLS; MICROCRYSTALLINE SILICON; MICROMORPH TANDEM; TOP CELL; PERFORMANCE;

D O I：

10.1016/j.apenergy.2008.11.034

中图分类号：

TE [石油、天然气工业]; TK [能源与动力工程];

学科分类号：

0807 ; 0820 ;

摘要：

Thin film photovoltaics is a particularly attractive technology for building integration. In this paper, we present our analysis on architectural issues and technological developments of thin film silicon photovoltaics. In particular, we focus on our activities related to transparent and conductive oxide (TCO) and thin film amorphous and microcrystalline silicon solar cells. The research on TCO films is mainly dedicated to large-area deposition of zinc oxide (ZnO) by low pressure-metallorganic chemical vapor deposition. ZnO material, with a low sheet resistance (<8 Omega/sq) and with an excellent transmittance (>82%) in the whole wavelength range of photovoltaic interest, has been obtained. "Micromorph" tandem devices, consisting of an amorphous silicon top cell and a microcrystalline silicon bottom cell, are fabricated by using the very high frequency plasma enhanced chemical vapor deposition technique. An initial efficiency of 11.1% (>10% stabilized) has been obtained. (C) 2008 Elsevier Ltd. All rights reserved.

引用

页码：1836 / 1844

页数：9

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