Heteroepitaxy of hafnium diboride on a hafnium(0001) single crystal surface

被引:15
作者
Belyansky, M [1 ]
Trenary, M [1 ]
机构
[1] UNIV ILLINOIS,DEPT CHEM,CHICAGO,IL 60607
关键词
D O I
10.1021/cm9604423
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
A novel heteroepitaxial structure is formed between the metallic hard material hafnium diboride and a hafnium single-crystal substrate. The film is formed by chemical vapor deposition of boron at 750 degrees C using diborane gas and is characterized with X-ray photoelectron spectroscopy, low-energy electron diffraction, and X-ray diffraction.
引用
收藏
页码:403 / &
页数:4
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