Heteroepitaxy of hafnium diboride on a hafnium(0001) single crystal surface

被引：15

作者：

Belyansky, M ^{[1
]}

Trenary, M ^{[1
]}

机构：

[1] UNIV ILLINOIS,DEPT CHEM,CHICAGO,IL 60607

来源：

CHEMISTRY OF MATERIALS | 1997年 / 9卷 / 02期

关键词：

D O I：

10.1021/cm9604423

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

A novel heteroepitaxial structure is formed between the metallic hard material hafnium diboride and a hafnium single-crystal substrate. The film is formed by chemical vapor deposition of boron at 750 degrees C using diborane gas and is characterized with X-ray photoelectron spectroscopy, low-energy electron diffraction, and X-ray diffraction.

引用

页码：403 / &

页数：4

共 30 条

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BELYANSKY M, IN PRESS

[2] STRUCTURE AND PROPERTIES OF REFRACTORY COMPOUNDS DEPOSITED BY DIRECT EVAPORATION [J].