Low-resistivity ZnO:F:Al transparent thin films

被引:56
作者
Altamirano-Juárez, DC [1 ]
Torres-Delgado, G [1 ]
Jiménez-Sandoval, S [1 ]
Jiménez-Sandoval, O [1 ]
Castanedo-Pérez, R [1 ]
机构
[1] Inst Politecn Nacl, Ctr Invest & Estudios Avanzados, Unidad Queretaro, Queretaro 76001, Qro, Mexico
关键词
ZnO films; sol-gel; transparent conductive oxides;
D O I
10.1016/j.solmat.2004.01.003
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
Polycrystalline ZnO thin films doped with Al and F in nominal concentrations of 0.25 at% each element, have been obtained by the sol-gel technique. The films show a good adherence to the substrate, transmissions higher than 90% for wavelengths above 430 nm, and low resistivities: 8.6 x 10(-3) Omegacm in darkness, and 5.6 x 10(-3) Omegacm under controlled illumination. These values are among the lowest obtained to date for doped ZNO. The mobility, 27cm(2)/Vs, is one of the highest reported for this kind of materials. When both dopants, Al and F, are present in small quantities, they contribute to the resistivity decrease of the ZnO films, while the high optical transmission is maintained. Due to their good optical and electrical properties, ZnO:F:Al films are promising candidates for their use as transparent electrodes ill solar cells. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:35 / 43
页数:9
相关论文
共 26 条
[1]  
ALTAMIRANOJUARE.DC, 2001, SUPERFICIES VACIO, V13, P66
[2]   Study of structural and electrical properties of grain-boundary modified ZnO films prepared by sol-gel technique [J].
Bandyopadhyay, S ;
Paul, GK ;
Roy, R ;
Sen, SK ;
Sen, S .
MATERIALS CHEMISTRY AND PHYSICS, 2002, 74 (01) :83-91
[3]   Influence of annealing temperature on the formation and characteristics of sol-gel prepared ZnO films [J].
Castanedo-Pérez, R ;
Jiménez-Sandoval, O ;
Jiménez-Sandoval, S ;
Márquez-Marín, J ;
Mendoza-Galván, A ;
Torres-Delgado, G ;
Maldonado-Alvarez, A .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1999, 17 (04) :1811-1816
[4]   Fluorine doping in transparent conductive ZnO thin films by a sol-gel method using trifluoroacetic acid [J].
Fujihara, S ;
Kusakado, J ;
Kimura, T .
JOURNAL OF MATERIALS SCIENCE LETTERS, 1998, 17 (09) :781-783
[5]   Studies on ZnO:Al thin films deposited by in-line reactive mid-frequency magnetron sputtering [J].
Hong, RJ ;
Jiang, X ;
Szyszka, B ;
Sittinger, V ;
Pflug, A .
APPLIED SURFACE SCIENCE, 2003, 207 (1-4) :341-350
[6]   TEXTURED FLUORINE-DOPED ZNO FILMS BY ATMOSPHERIC-PRESSURE CHEMICAL VAPOR-DEPOSITION AND THEIR USE IN AMORPHOUS-SILICON SOLAR-CELLS [J].
HU, JH ;
GORDON, RG .
SOLAR CELLS, 1991, 30 (1-4) :437-450
[7]   XPS and X-ray diffraction studies of aluminum-doped zinc oxide transparent conducting films [J].
Islam, MN ;
Ghosh, TB ;
Chopra, KL ;
Acharya, HN .
THIN SOLID FILMS, 1996, 280 (1-2) :20-25
[8]  
Kwon TH, 1998, SENSOR ACTUAT B-CHEM, V46, P75
[9]   Highly textured ZnO thin films doped with indium prepared by the pyrosol method [J].
Lee, CH ;
Lim, KS ;
Song, JS .
SOLAR ENERGY MATERIALS AND SOLAR CELLS, 1996, 43 (01) :37-45
[10]   Characteristics of spray pyrolytic ZnO thin films [J].
Lee, CH ;
Lin, LY .
APPLIED SURFACE SCIENCE, 1996, 92 :163-166