Low-temperature thin-film deposition and crystallization

被引：96

作者：

Park, S

Clark, BL

Keszler, DA

Bender, JP

Wager, JF

Reynolds, TA

Herman, GS

机构：

[1] Oregon State Univ, Dept Chem, Corvallis, OR 97331 USA

[2] Oregon State Univ, Dept Elect & Comp Engn, Corvallis, OR 97331 USA

[3] ReyTech Corp, Bend, OR 97702 USA

[4] Hewlett Packard Corp, Corvallis, OR 97330 USA

来源：

关键词：

D O I：

10.1126/science.1072009

中图分类号：

O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];

学科分类号：

07 ; 0710 ; 09 ;

摘要：

引用

页码：65 / 65

页数：1

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