Low-Temperature Atmospheric-Pressure-Plasma Jet for Thin-Film Deposition

被引：29

作者：

Huang, Chun ^{[1
]}

Hsu, Wen-Tung ^{[2
]}

Liu, Chi-Hung ^{[2
]}

Wu, Shin-Yi ^{[1
]}

Yang, Shih-Hsien ^{[2
]}

Chen, Tai-Hung ^{[2
]}

Wei, Ta-Chin ^{[3
]}

机构：

[1] Yuan Ze Univ, Yuan Ze Fuel Cell Ctr, Dept Mat Sci & Chem Engn, Chungli 32003, Taiwan

[2] Ind Technol Res Inst, Mech & Syst Res Labs, Hsinchu 310, Taiwan

[3] Chung Yuan Christian Univ, Dept Chem Engn, R&D Ctr Membrane Technol, Chungli 320, Taiwan

来源：

IEEE TRANSACTIONS ON PLASMA SCIENCE | 2009年 / 37卷 / 07期

关键词：

Atmospheric-pressure-plasma jet (APPJ); plasma applications; plasma CVD; plasma devices;

D O I：

10.1109/TPS.2008.2011636

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

A novel plasma system based on double-pipe method was generated for the development of an atmospheric-pressure-plasma jet (APPJ). This APPJ deposits homogeneous thin films without unfavorable contamination in plasma source. The experimentally measured gas-phase temperature of the argon APPJ maintained at RF electric power was around 40 degrees C-80 degrees C, indicating this APPJ to be a low-temperature plasma. This plasma system will provide a chamberless deposition for coating application.

引用

页码：1127 / 1128

页数：2

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