Identity of passive film formed on aluminum in Li-ion battery electrolytes with LiPF6
被引:83
作者:
Zhang, Xueyuan
论文数: 0引用数: 0
h-index: 0
机构:
Lawrence Berkeley Natl Lab, Energy Environm & Technol Div, Berkeley, CA 94704 USALawrence Berkeley Natl Lab, Energy Environm & Technol Div, Berkeley, CA 94704 USA
Zhang, Xueyuan
[1
]
Devine, T. M.
论文数: 0引用数: 0
h-index: 0
机构:Lawrence Berkeley Natl Lab, Energy Environm & Technol Div, Berkeley, CA 94704 USA
Devine, T. M.
机构:
[1] Lawrence Berkeley Natl Lab, Energy Environm & Technol Div, Berkeley, CA 94704 USA
[2] Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USA
The passive film that forms on aluminum in 1:1 ethylene carbonate+ethylmethyl carbonate with 1.2 M LiPF6 and 1:1 ethylene carbonate+dimethyl carbonate with 1.0 M LiPF6 was investigated by a combination of electrochemical quartz crystal microbalance measurements (EQCM), electrochemical impedance spectroscopy (EIS), and X-ray photoelectron spectroscopy. During anodic polarization of aluminum a film of AlF3 forms on top of the air-formed oxide, creating a duplex, or two-layered film. The thickness of the AlF3 increases with the applied potential. Independent measurements of film thickness by EQCM and EIS indicate that at a potential of 5.5 V vs Li/Li+, the thickness of the AlF3 is approximately 1 nm.
机构:
Tokyo Metropolitan Univ, Grad Sch Engn, Dept Appl Chem, Hachioji, Tokyo 1920397, JapanTokyo Metropolitan Univ, Grad Sch Engn, Dept Appl Chem, Hachioji, Tokyo 1920397, Japan
Kanamura, K
Hoshikawa, W
论文数: 0引用数: 0
h-index: 0
机构:
Tokyo Metropolitan Univ, Grad Sch Engn, Dept Appl Chem, Hachioji, Tokyo 1920397, JapanTokyo Metropolitan Univ, Grad Sch Engn, Dept Appl Chem, Hachioji, Tokyo 1920397, Japan
Hoshikawa, W
Umegaki, T
论文数: 0引用数: 0
h-index: 0
机构:
Tokyo Metropolitan Univ, Grad Sch Engn, Dept Appl Chem, Hachioji, Tokyo 1920397, JapanTokyo Metropolitan Univ, Grad Sch Engn, Dept Appl Chem, Hachioji, Tokyo 1920397, Japan
机构:
Tokyo Metropolitan Univ, Grad Sch Engn, Dept Appl Chem, Hachioji, Tokyo 1920397, JapanTokyo Metropolitan Univ, Grad Sch Engn, Dept Appl Chem, Hachioji, Tokyo 1920397, Japan
Kanamura, K
Hoshikawa, W
论文数: 0引用数: 0
h-index: 0
机构:
Tokyo Metropolitan Univ, Grad Sch Engn, Dept Appl Chem, Hachioji, Tokyo 1920397, JapanTokyo Metropolitan Univ, Grad Sch Engn, Dept Appl Chem, Hachioji, Tokyo 1920397, Japan
Hoshikawa, W
Umegaki, T
论文数: 0引用数: 0
h-index: 0
机构:
Tokyo Metropolitan Univ, Grad Sch Engn, Dept Appl Chem, Hachioji, Tokyo 1920397, JapanTokyo Metropolitan Univ, Grad Sch Engn, Dept Appl Chem, Hachioji, Tokyo 1920397, Japan