In situ STM and EQCM studies of tantalum electrodeposition from TaF5 in the air- and water-stable ionic liquid 1-butyl-1-methylpyrrolidinium bis(trifluoromethylsulfonyl)amide

被引：62

作者：

Borisenko, N. ^{[2
]}

Ispas, A. ^{[1
]}

Zschippang, E. ^{[1
]}

Liu, Q. ^{[2
]}

El Abedin, S. Zein ^{[2
]}

Bund, A. ^{[1
]}

Endres, F. ^{[2
]}

机构：

[1] Tech Univ Dresden, Lehrstuhl Phys Chem & Elektrochem, D-01062 Dresden, Germany

[2] Clausthal Univ Technol, Inst Particle Technol, Chair Interface Proc, D-38678 Clausthal Zellerfeld, Germany

来源：

ELECTROCHIMICA ACTA | 2009年 / 54卷 / 05期

关键词：

Electrodeposition; Tantalum; Ionic liquid; In situ STM; EQCM; SCANNING-TUNNELING-MICROSCOPY; CORROSION BEHAVIOR; ROOM-TEMPERATURE; MOLTEN FLUORIDES; ACID-SOLUTIONS; THIN-FILMS; DEPOSITION; NIOBIUM; ALLOYS;

D O I：

10.1016/j.electacta.2008.09.042

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

The electroreduction of 0.5 M TaF5 on Au(111) and on polycrystalline gold substrates was investigated at room temperature in the ionic liquid 1-butyl-1-methylpyrrolidinium bis(trifluoromethylsulfonyl)amide, [Py-1,Py-4]TFSA, by cyclic voltammetry, in situ scanning tunneling microscopy (STM) and electrochemical quartz crystal microbalance (EQCM). The electrochemical reduction of TaF5 in the employed ionic liquid Occurs in several steps. The first redox process is attributed to the reduction of TaF5 to TaF3, which likely occurs in the solution. as EQCM indicates no mass change. The electrodeposition of tantalum occurs only in a very narrow potential window and is preceded by the formation of various non-stoichiometric tantalum subhalides. Attempts to deposit micrometer thick tantalum layers at room temperature fail, presumably because of kinetic reasons. (C) 2008 Elsevier Ltd. All rights reserved.

引用

页码：1519 / 1528

页数：10

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