Magnetic force microscopy of single-domain cobalt dots patterned using interference lithography

被引:86
作者
Fernandez, A
Bedrossian, PJ
Baker, SL
Vernon, SP
Kania, DR
机构
[1] Lawrence Livermore National Laboratory, Livermore
关键词
D O I
10.1109/20.538901
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We have fabricated arrays of Co dots having diameters of 100 nm and 70 nm using interference lithography. The density of these arrays is 7.2x10(9)/in(2). Magnetic force microscopy measurements indicate that the Co dots are single-domain with moments that can be controlled to point either in-plane or out-of-plane. Interference lithography is a process that is easily scaled to large areas and is potentially capable of high throughput. Large, uniform arrays of single-domain structures are potentially useful for high-density, low-noise data storage.
引用
收藏
页码:4472 / 4474
页数:3
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