Achromatic interferometric lithography for 100-nm-period gratings and grids

被引：103

作者：

Savas, TA

Shah, SN

Schattenburg, ML

Carter, JM

Smith, HI

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1995年 / 13卷 / 06期

关键词：

D O I：

10.1116/1.588255

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

For the fabrication of periodic structures with spatial periods of 100 nm or less. achromatic interferometric lithography is preferred over other lithographic techniques. We report on processes we have developed, using achromatic interferometric lithography, to fabricate large-area coherent gratings and grids with spatial periods of 100 nm. (C) 1995 American Vacuum Society.

引用

页码：2732 / 2735

页数：4

共 16 条

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