Coherence of large gratings and electron-beam fabrication techniques for atom-wave interferometry

被引：7

作者：

Rooks, MJ

Tiberio, RC

Chapman, M

Hammond, T

Smith, E

Lenef, A

Rubenstein, R

Pritchard, D

Adams, S

机构：

[1] MIT,DEPT PHYS,CAMBRIDGE,MA 02139

[2] CORNELL UNIV,DEPT THEORET & APPL MECH,ITHACA,NY 14853

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1995年 / 13卷 / 06期

关键词：

D O I：

10.1116/1.588258

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We describe the fabrication of slotted, free-standing structures used as amplitude gratings in a separated-beam interferometer. Improvements in electron-beam writing techniques have allowed us to compensate for electron-beam system drift, making practical the exposure of 800xX00 mu m gratings with period as small as 0.14 mu m. Alignment marks are used for periodic drift compensation. Finite element analysis of fracture formation in silicon nitride films gives us a tool for the prediction of structural failure in arbitrarily shaped free-standing structures. (C) 1995 American Vacuum Society.

引用

页码：2745 / 2751

页数：7

共 18 条

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