Oxidation of alkylsilane-based monolayers on gold

被引：12

作者：

Owens, TM

Ludwig, BJ

Schneider, KS

Fosnacht, DR

Orr, BG

Holl, MMB ^{[1
]}

机构：

[1] Univ Michigan, Dept Chem, Ann Arbor, MI 48109 USA

[2] Univ Michigan, Dept Phys, Ann Arbor, MI 48109 USA

[3] Univ Michigan, Appl Phys Program, Ann Arbor, MI 48109 USA

来源：

LANGMUIR | 2004年 / 20卷 / 22期

关键词：

D O I：

10.1021/la0496385

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

The oxidation of alkylsilane monolayers on Au has been studied by X-ray photoelectron spectroscopy, reflection-absorption infrared spectroscopy, contact-angle measurements, and scanning tunneling microscopy. Exposure of the monolayers at 298 K to pure O-2 or H2O (> 5 x 10(-5) Torr and > 150 000 L) does not cause oxidation. Ambient atmosphere only causes oxidation if direct sight lines are maintained to the sample. Ozone exposure results in rapid monolayer oxidation. Oxidation initially occurs only at the Si atom, resulting in formation of a cross-linked siloxane monolayer that retains alkyl surface termination. Prolonged ozone exposures result in the oxidation and subsequent loss of the alkyl chain.

引用

收藏

页码：9636 / 9645

页数：10

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