The d.c. magnetron sputtering behavior of TiO2-x targets with added Fe2O3 or Nd2O3

被引:8
作者
Eufinger, K.
Tomaszewski, H.
Depla, D.
Poelman, H.
Poelman, D.
De Gryse, R.
机构
[1] Univ Ghent, Dept Solid State Sci, Surface Phys & Thin Film Div, B-9000 Ghent, Belgium
[2] ITME, Warsaw, Poland
关键词
d.c. magnetron sputtering; TiO2; ceramic targets; mixed oxides; Fe2O3; Nd2O3;
D O I
10.1016/j.tsf.2005.12.241
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Targets of 6 min thickness were prepared from TiO2 powder with different amounts of Fe2O3 and Nd2O3 added. The targets were sintered in a vacuum furnace to obtain sub-stoichiometric rutile TiO2-x. For both added metal oxides, it was found that they were present as titanates forming a second phase. The sputtering behavior of these mixed-oxide targets was investigated. First, the dependence of the discharge voltage and the deposition speed on the argon pressure was measured. Second, the effect of the oxygen addition on the same two parameters was investigated. Both were compared with the dependencies measured for a pure TiO2-x target. All experiments were performed in constant power mode. The results show that Fe2O3 and Nd2O3 exhibit different effects on the sputtering behavior of TiO2-x targets. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:683 / 686
页数:4
相关论文
共 8 条
[1]   Fundamental understanding and modeling of reactive sputtering processes [J].
Berg, S ;
Nyberg, T .
THIN SOLID FILMS, 2005, 476 (02) :215-230
[2]   Photoinduced reactivity of titanium dioxide [J].
Carp, O ;
Huisman, CL ;
Reller, A .
PROGRESS IN SOLID STATE CHEMISTRY, 2004, 32 (1-2) :33-177
[3]   Influence of oxygen addition on the target voltage during reactive sputtering of aluminium [J].
Depla, D ;
De Gryse, R .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 2001, 10 (04) :547-555
[4]  
DEPLA D, IN PRESS PLASMA SOUR
[5]   PREFERENTIAL SPUTTERING OF OXIDES - A COMPARISON OF MODEL PREDICTIONS WITH EXPERIMENTAL-DATA [J].
MALHERBE, JB ;
HOFMANN, S ;
SANZ, JM .
APPLIED SURFACE SCIENCE, 1986, 27 (03) :355-365
[6]   Electronic and optical characterisation of TiO2 films deposited from ceramic targets [J].
Poelman, H ;
Poelman, D ;
Depla, D ;
Tomaszewski, H ;
Fiermans, L ;
De Gryse, R .
SURFACE SCIENCE, 2001, 482 :940-945
[7]  
SCHRODER DK, 1998, SEMICONDUCTOR MAT DE
[8]   Glow discharge mass spectrometry study of the deposition of TiO2 thin films by direct current reactive magnetron sputtering of a Ti target [J].
Vancoppenolle, V ;
Jouan, PY ;
Wautelet, M ;
Dauchot, JP ;
Hecq, M .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1999, 17 (06) :3317-3321