PREFERENTIAL SPUTTERING OF OXIDES - A COMPARISON OF MODEL PREDICTIONS WITH EXPERIMENTAL-DATA

[1] SPUTTERING OF MULTICOMPONENT METAL AND SEMICONDUCTOR TARGETS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02): : 770 - 771

[2] ANDERSEN HH, 1984, ION IMPLANTATION BEA, pCH6

[3] BETZ G, 1984, SPUTTERING PARTICLE, V2, pCH2

[4] Blaise G., 1978, Material Characterization Using Ion Beams. Lectures Presented at the NATO Advanced Study Institute on Material Characterization Using Ion Beams, P143

[5] SURFACE SEGREGATION IN CU-NI AND CU-PT ALLOYS - COMPARISON OF LOW-ENERGY ION-SCATTERING RESULTS WITH THEORY [J]. SURFACE SCIENCE, 1978, 71 (03) : 657 - 678

[6] ANODIC OXIDE ON GAAS - QUANTITATIVE CHEMICAL DEPTH PROFILES OBTAINED USING AUGER-SPECTROSCOPY AND NEUTRON-ACTIVATION ANALYSIS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (06) : 922 - 926

[7] MODEL FOR SURFACE-LAYER COMPOSITION CHANGES IN SPUTTERED ALLOYS AND COMPOUNDS [J]. APPLIED PHYSICS LETTERS, 1977, 31 (04) : 259 - 260

[8] PREFERRED SPUTTERING ON BINARY ALLOY SURFACES OF THE AL-PD-SISYSTEM [J]. SURFACE SCIENCE, 1979, 85 (01) : 19 - 28

[9] AN XPS STUDY OF THE INFLUENCE OF ION SPUTTERING ON BONDING IN THERMALLY GROWN SILICON DIOXIDE [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (01): : 43 - 47

[10] Hofmann S., 1983, MIKROCHIM ACTA S, V10, P135

[1] SPUTTERING OF MULTICOMPONENT METAL AND SEMICONDUCTOR TARGETS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02): : 770 - 771

[2] ANDERSEN HH, 1984, ION IMPLANTATION BEA, pCH6

[3] BETZ G, 1984, SPUTTERING PARTICLE, V2, pCH2

[4] Blaise G., 1978, Material Characterization Using Ion Beams. Lectures Presented at the NATO Advanced Study Institute on Material Characterization Using Ion Beams, P143

[5] SURFACE SEGREGATION IN CU-NI AND CU-PT ALLOYS - COMPARISON OF LOW-ENERGY ION-SCATTERING RESULTS WITH THEORY [J]. SURFACE SCIENCE, 1978, 71 (03) : 657 - 678

[6] ANODIC OXIDE ON GAAS - QUANTITATIVE CHEMICAL DEPTH PROFILES OBTAINED USING AUGER-SPECTROSCOPY AND NEUTRON-ACTIVATION ANALYSIS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (06) : 922 - 926

[7] MODEL FOR SURFACE-LAYER COMPOSITION CHANGES IN SPUTTERED ALLOYS AND COMPOUNDS [J]. APPLIED PHYSICS LETTERS, 1977, 31 (04) : 259 - 260

[8] PREFERRED SPUTTERING ON BINARY ALLOY SURFACES OF THE AL-PD-SISYSTEM [J]. SURFACE SCIENCE, 1979, 85 (01) : 19 - 28

[9] AN XPS STUDY OF THE INFLUENCE OF ION SPUTTERING ON BONDING IN THERMALLY GROWN SILICON DIOXIDE [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (01): : 43 - 47

[10] Hofmann S., 1983, MIKROCHIM ACTA S, V10, P135