RF capillary jet - a tool for localized surface treatment

被引：91

作者：

Foest, R. ^{[1
]}

Kindel, E. ^{[1
]}

Lange, H. ^{[1
]}

Ohl, A. ^{[1
]}

Stieber, M. ^{[1
]}

Weltmann, K. -D. ^{[1
]}

机构：

[1] Inst Low Temperature Plasma Phys, INP, D-17489 Greifswald, Germany

来源：

CONTRIBUTIONS TO PLASMA PHYSICS | 2007年 / 47卷 / 1-2期

关键词：

atmospheric pressure plasma; plasma cleaning and plasma activation; protective coatings; plasma enhanced CVD; UV emission;

D O I：

10.1002/ctpp.200710017

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

The UV/VUV spectrum of a non-thermal capillary plasma jet operating with Ar at ambient atmosphere and the temperature load of a substrate exposed to the jet have been measured. The VUV radiation is assigned to N, H, and O atomic lines along with an Ar*(2) excimer continuum. The absolute radiance (115 - 200 mn) of the source has been determined. Maximum values of 880 mu W/mm(2) sr are obtained. Substrate temperatures range between 35 degrees C for low powers and high gas flow conditions and 95 degrees C for high powers and reduced gas flow. The plasma source (13.56, 27.12 or 40.78 MHz) can be operated in Ar and in N-2. The further addition of a low percentage of silicon containing reactive admixtures has been demonstrated for thin film deposition. Several further applications related to surface modification have been successfully applied.

引用

页码：119 / 128

页数：10

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