Structure of epitaxial Gd2O3 films grown on GaAs(100)

被引:41
作者
Kortan, AR [1 ]
Hong, M [1 ]
Kwo, J [1 ]
Mannaerts, JP [1 ]
Kopylov, N [1 ]
机构
[1] Bell Labs, Lucent Technol, Murray Hill, NJ 07974 USA
来源
PHYSICAL REVIEW B | 1999年 / 60卷 / 15期
关键词
D O I
10.1103/PhysRevB.60.10913
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Single-crystal Gd2O3 films were grown epitaxially on GaAs(100) substrate. From the single-crystal momentum space analysis on four different samples, 185, 45, 25, and 18 Angstrom, thick, a Mn2O3 isomorphous cubic structure is identified. The Gd2O3 him aligns its twofold (110) axis with the fourfold (100) surface normal of the substrate, while aligning its [001] and [(1) over bar 10] axes with the [011] and [01 (1) over bar] axes of GaAs within the plane, respectively. The absence of the other possible twofold growth orientation can be explained by the bonding configuration at the interface. The 18- and 25-Angstrom-thick samples show an elastically strained component in the film, while thicker samples appear fully relaxed, probably through misfit dislocation formation. [S0163-1829(99)08439-8].
引用
收藏
页码:10913 / 10918
页数:6
相关论文
共 10 条
  • [1] ANON, 1991, P1
  • [2] As surface segregation during the growth of GaInP on GaAs
    Dehaese, O
    Wallart, X
    Schuler, O
    Mollot, F
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1997, 36 (11): : 6620 - 6624
  • [3] DEPENDENCE OF CRITICAL LAYER THICKNESS ON STRAIN FOR INXGA1-XAS/GAAS STRAINED-LAYER SUPERLATTICES
    FRITZ, IJ
    PICRAUX, ST
    DAWSON, LR
    DRUMMOND, TJ
    LAIDIG, WD
    ANDERSON, NG
    [J]. APPLIED PHYSICS LETTERS, 1985, 46 (10) : 967 - 969
  • [4] STRUCTURES OF ALPHA-MN2O3,(MN0.983FE0.017)2O3 AND (MN0.37FE0.63)2O3 AND RELATION TO MAGNETIC ORDERING
    GELLER, S
    [J]. ACTA CRYSTALLOGRAPHICA SECTION B-STRUCTURAL CRYSTALLOGRAPHY AND CRYSTAL CHEMISTRY, 1971, B 27 (APR15): : 821 - &
  • [5] GRIER D, UNPUB
  • [6] Surface passivation of GaAs with ultrathin Si3N4/Si interface control layer formed by MBE and in situ ECR plasma nitridation
    Hashizume, T
    Ikeya, K
    Mutoh, M
    Hasegawa, H
    [J]. APPLIED SURFACE SCIENCE, 1998, 123 : 599 - 602
  • [7] Low interface state density oxide-GaAs structures fabricated by in situ molecular beam epitaxy
    Hong, M
    Passlack, M
    Mannaerts, JP
    Kwo, J
    Chu, SNG
    Moriya, N
    Hou, SY
    Fratello, VJ
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (03): : 2297 - 2300
  • [8] Epitaxial cubic gadolinium oxide as a dielectric for gallium arsenide passivation
    Hong, M
    Kwo, J
    Kortan, AR
    Mannaerts, JP
    Sergent, AM
    [J]. SCIENCE, 1999, 283 (5409) : 1897 - 1900
  • [9] The (Ga2O3)1-x(Gd2O3)x oxides with x=0-1.0 for GaAs passivation
    Kwo, J
    Hong, M
    Kortan, AR
    Murphy, DW
    Mannaerts, JP
    Sergent, AM
    Wang, YC
    Hsieh, KC
    [J]. COMPOUND SEMICONDUCTOR SURFACE PASSIVATION AND NOVEL DEVICE PROCESSING, 1999, 573 : 57 - 67
  • [10] Peculiarities of the MBE growth physics and technology of narrow-gap II-VI compounds
    Sidorov, YG
    Dvoretsky, SA
    Yakushev, MV
    Mikhailov, NN
    Varavin, VS
    Liberman, VI
    [J]. THIN SOLID FILMS, 1997, 306 (02) : 253 - 265