Band gaps of InN and group III nitride alloys

被引:160
作者
Wu, J [1 ]
Walukiewicz, W [1 ]
机构
[1] Univ Calif Berkeley, Lawrence Berkeley Lab, Div Mat Sci, Berkeley, CA 94720 USA
关键词
D O I
10.1016/j.spmi.2004.03.069
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
We review the fundamental band gaps of wurtzite InN and group III nitride ternary alloys in the light of the recent discovery of the narrow band gap of InN. The results on the composition, temperature and hydrostatic pressure dependence of the band gaps of these alloys are summarized and discussed. The role of the Burstein-Moss shift for the accurate determination of the band gap is emphasized. The impact of the narrow band gap of InN on new device applications of group III nitrides is briefly discussed. (C) 2004 Elsevier Ltd. All rights reserved.
引用
收藏
页码:63 / 75
页数:13
相关论文
共 43 条
[1]   GAAS, ALAS, AND ALXGA1-XAS - MATERIAL PARAMETERS FOR USE IN RESEARCH AND DEVICE APPLICATIONS [J].
ADACHI, S .
JOURNAL OF APPLIED PHYSICS, 1985, 58 (03) :R1-R29
[2]   Pressure dependence of the optical-absorption edge of AlN and graphite-type BN [J].
Akamaru, F ;
Onodera, A ;
Endo, T ;
Mishima, O .
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 2002, 63 (05) :887-894
[3]   Optical constants of epitaxial AlGaN films and their temperature dependence [J].
Brunner, D ;
Angerer, H ;
Bustarret, E ;
Freudenberg, F ;
Hopler, R ;
Dimitrov, R ;
Ambacher, O ;
Stutzmann, M .
JOURNAL OF APPLIED PHYSICS, 1997, 82 (10) :5090-5096
[4]   OPTICAL AND STRUCTURAL-PROPERTIES OF III-V NITRIDES UNDER PRESSURE [J].
CHRISTENSEN, NE ;
GORCZYCA, I .
PHYSICAL REVIEW B, 1994, 50 (07) :4397-4415
[5]  
Davydov VY, 2002, PHYS STATUS SOLIDI B, V229, pR1, DOI 10.1002/1521-3951(200202)229:3<R1::AID-PSSB99991>3.0.CO
[6]  
2-O
[7]   ELECTRICAL AND OPTICAL PROPERTIES OF RF-SPUTTERED GAN AND INN [J].
HOVEL, HJ ;
CUOMO, JJ .
APPLIED PHYSICS LETTERS, 1972, 20 (02) :71-&
[8]   Effect of polarization fields on transport properties in AlGaN/GaN heterostructures [J].
Hsu, L ;
Walukiewicz, W .
JOURNAL OF APPLIED PHYSICS, 2001, 89 (03) :1783-1789
[9]  
Inushima T, 1996, INST PHYS CONF SER, V142, P971
[10]   Phonon structure of InN grown by atomic layer epitaxy [J].
Inushima, T ;
Shiraishi, T ;
Davydov, VY .
SOLID STATE COMMUNICATIONS, 1999, 110 (09) :491-495