Exposure of monomolecular lithographic patterns to ambient: An X-ray photoemission spectromicroscopy study

被引:16
作者
Chen, C. -H.
Huang, M. -L.
Wang, S. -C.
Klauser, R.
Shaporenko, A.
Zharnikov, M.
机构
[1] Natl Synchrotron Radiat Res Ctr, Hsinchu 30076, Taiwan
[2] Univ Heidelberg, D-69120 Heidelberg, Germany
关键词
D O I
10.1021/jp063779t
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Patterned self-assembled monolayers (SAMs) of alkanethiolates (AT) on Au and Ag substrates were imaged and characterized by scanning photoelectron microscopy (SPEM). The patterns were prepared in situ by direct writing with the zone-plate-focused X-ray beam provided by the SPEM station. Whereas both AT/Au and AT/Ag behaved alike upon the irradiation, which resulted in similar contrasts in the fabricated patterns and similar microspot spectra from the irradiated areas, the intensity relationship between the patterned and nonpatterned areas changed by different pathways for the Au and Ag substrates after the exposure of the patterns to ambient. The SPEM data imply that weakly bound molecular fragments are desorbed from the irradiated areas upon air exposure in the case of Ag, whereas adsorption of airborne molecules from ambient occurs for the Au substrate. The origin of the observed differences is presumably related to the specific branching patterns of irradiation-induced modification of AT/Au and AT/Ag.
引用
收藏
页码:17878 / 17883
页数:6
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